LAPLACE-SEMI

LAPLACE-SEMI

Laplace (Guangzhou) Semiconductor Technology Co., Ltd. is a leading domestic high-tech enterprise focusing on silicon carbide-based "third-generation semiconductor" thermal process equipment. It is wholly owned by Laplace New Energy Technology Co., Ltd. Subsidiary.
Laplace Group Size:

LAPLACE-SEMI

2016

Company establishment 2016

6

R & D Center

4

Production Sites

3

customer service center

Semiconductor Equipment
Ceramic Substrate Equipment

Silicon Carbide Oxidation Furnace

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Silicon Carbide Oxidation  Furnace
Silicon Carbide Oxidation  Furnace

Vertical LPCVD Furnace

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Vertical LPCVD Furnace
Vertical LPCVD Furnace

Horizontal Multi-functional Furnace

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Horizontal Multi-functional Furnace
Horizontal Multi-functional Furnace

Ceramic Substrate Equipment

Horizontal pre oxidation furnace

Pre oxidation of copper sheets on ceramic substrates or other substrates

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Horizontal pre oxidation furnace
Horizontal pre oxidation furnace

Chain belt sintering furnace&oxidation furnace

Pre oxidation and DBC high-temperature sintering of various metal materials

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Chain belt sintering furnace&oxidation furnace
Chain belt sintering furnace&oxidation furnace

Degumming furnace

degumming treatment of AlN、Si₃N₄、Al₂O₃、ZrO₂、dielectric ceramics, and elaborate ceramic components

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Degumming furnace
Degumming furnace

Vacuum brazing equipment

Ceramic substrate vacuum active metal brazing (AMB) and metal heat treatment

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Vacuum brazing equipment
Vacuum brazing equipment

Vacuum pressure high-temperature sintering furnace

Vacuum sintering, pressure sintering, atmosphere sintering, rapid cooling furnace

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Vacuum pressure high-temperature sintering furnace
Vacuum pressure high-temperature sintering furnace

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