Applications of LPCVD

Application of LPCVD Process LPCVD (Low Pressure Chemical Vapor Deposition) is widely used in chip manufacturing to create various thin films with different purposes. It can be employed for depositing silicon dioxide and silicon nitride films, as well as for producing doped films to modify the conductivity of silicon.

Application of Oxidation Process

Oxidation reaction is one of the fundamental processes in semiconductor chip fabrication. It is an additive process where oxygen is introduced to the silicon wafer, resulting in the formation of a thin layer of silicon dioxide on the wafer surface. This thin film is formed at high temperatures, hence it is also referred to as "thermal oxidation."