12-inch Vertical Oxidation Furnace
Function
Technical Parameters
Bhadra™ 300 Series Vertical Furnace
Advantage
Primarily used for 12-inch oxidation, annealing, and LPCVD processes.
Consultationor call:
86-18924169069 / 020-31569374
Technical Parameters
Wafer size: 12 inches
Process Types: Oxidation, Annealing, LPCVD (SiN/POLY/TEOS/HTO)
Compatible material: Silicon
Application fields: Power semiconductors, Integrated circuits, Substrate materials, Research
